Band gap improvement in DRAM capacitors

ABSTRACT

A method for forming a DRAM MIM capacitor stack having low leakage current and low EOT involves the use of an compound high k dielectric material. The dielectric material further comprises a dopant. One component of the compound high k dielectric material is present in a concentration between about 30 atomic % and about 80 atomic and more preferably between about 40 atomic % and about 60 atomic %. In some embodiments, the compound high k dielectric material comprises an alloy of TiO 2  and ZrO 2  and further comprises a dopant of Al 2 O 3 . In some embodiments, the compound high k dielectric material comprises an admixture of TiO 2  and HfO 2  and further comprises a dopant of Al 2 O 3 .

CROSS-REFERENCE TO RELATED APPLICATIONS

This is a Continuation Application of U.S. patent application Ser. No. 13/237,065, filed on Sep. 20, 2011, which is herein incorporated by reference for all purposes.

This document relates to the subject matter of a joint research agreement between Intermolecular, Inc. and Elpida Memory, Inc

FIELD OF THE INVENTION

The present invention generally relates to the field of dynamic random access memory (DRAM), and more particularly to dielectric material processing for improved DRAM performance.

BACKGROUND OF THE INVENTION

Dynamic Random Access Memory utilizes capacitors to store bits of information within an integrated circuit. A capacitor is formed by placing a dielectric material between two electrodes formed from conductive materials. A capacitor's ability to hold electrical charge (i.e., capacitance) is a function of the surface area of the capacitor plates A, the distance between the capacitor plates d (i.e. the physical thickness of the dielectric layer), and the relative dielectric constant or k-value of the dielectric material. The capacitance is given by:

$\begin{matrix} {C = {{\kappa ɛ}_{o}\frac{A}{d}}} & \left( {{Eqn}.\mspace{14mu} 1} \right) \end{matrix}$ where ∈_(o) represents the vacuum permittivity.

The dielectric constant is a measure of a material's polarizability. Therefore, the higher the dielectric constant of a material, the more charge the capacitor can hold. Therefore, if the k-value of the dielectric is increased, the area of the capacitor can be decreased and maintain the desired cell capacitance. Reducing the size of capacitors within the device is important for the miniaturization of integrated circuits. This allows the packing of millions (mega-bit (Mb)) or billions (giga-bit (Gb)) of memory cells into a single semiconductor device. The goal is to maintain a large cell capacitance (generally ˜10 to 25 fF) and a low leakage current (generally <10⁻⁷ A cm⁻²). The physical thickness of the dielectric layers in DRAM capacitors could not be reduced unlimitedly in order to avoid leakage current caused by tunneling mechanisms which exponentially increases as the thickness of the dielectric layer decreases.

Traditionally, SiO₂ has been used as the dielectric material and semiconducting materials (semiconductor-insulator-semiconductor [SIS] cell designs) have been used as the electrodes. The cell capacitance was maintained by increasing the area of the capacitor using very complex capacitor morphologies while also decreasing the thickness of the SiO₂ dielectric layer. Increases of the leakage current above the desired specifications have demanded the development of new capacitor geometries, new electrode materials, and new dielectric materials. Cell designs have migrated to metal-insulator-semiconductor (MIS) and now to metal-insulator-metal (MIM) cell designs for higher performance.

Typically, DRAM devices at technology nodes of 80 nm and below use MIM capacitors wherein the electrode materials are metals. These electrode materials generally have higher conductivities than the semiconductor electrode materials, higher work functions, exhibit improved stability over the semiconductor electrode materials, and exhibit reduced depletion effects. The electrode materials must have high conductivity to ensure fast device speeds. Representative examples of electrode materials for MIM capacitors are metals, conductive metal oxides, conductive metal silicides, conductive metal nitrides (i.e. TiN), or combinations thereof. MIM capacitors in these DRAM applications utilize insulating materials having a dielectric constant, or k-value, significantly higher than that of SiO₂ (k=3.9). For DRAM capacitors, the goal is to utilize dielectric materials with k values greater than about 40. Such materials are generally classified as high k materials. As used herein, “high k” will be understood to refer to k-values of greater than about 10. Representative examples of high k materials for MIM capacitors are non-conducting metal oxides, non-conducting metal nitrides, non-conducting metal silicates or combinations thereof. These dielectrics may also include additional dopant materials.

A figure of merit in DRAM technology is the electrical performance of the dielectric material as compared to SiO₂ known as the Equivalent Oxide Thickness (EOT). A high k material's EOT is calculated using a normalized measure of silicon dioxide (SiO₂ k=3.9) as a reference, given by:

$\begin{matrix} {{E\; O\; T} = {\frac{3.9}{\kappa} \cdot d}} & \left( {{Eqn}.\mspace{14mu} 2} \right) \end{matrix}$ where d represents the physical thickness of the capacitor dielectric.

As DRAM technologies scale below the 40 nm technology node, manufacturers must reduce the EOT of the high k dielectric films in MIM capacitors in order to increase charge storage capacity. The goal is to utilize dielectric materials that exhibit an EOT of less than about 0.8 nm while maintaining a physical thickness of about 5-20 nm.

Generally, as the dielectric constant of a material increases, the band gap of the material decreases. For example. The rutile phase of TiO₂ has a k-value of about 80 and a band gap of about 3.0 eV while ZrO₂ in the tetragonal phase has a k-value of about 43 and a band gap of about 5.8 eV. This leads to high leakage current in the device. As a result, without the utilization of countervailing measures, capacitor stacks implementing high k dielectric materials may experience large leakage currents. High work function electrodes (e.g., electrodes having a work function of greater than 5.0 eV) may be utilized in order to counter the effects of implementing a reduced band gap high k dielectric layer within the DRAM capacitor. Metals, such as platinum, gold, ruthenium, and ruthenium oxide are examples of high work function electrode materials suitable for inhibiting device leakage in a DRAM capacitor having a high k dielectric layer. The noble metal systems, however, are prohibitively expensive when employed in a mass production context. Moreover, electrodes fabricated from noble metals often suffer from poor manufacturing qualities, such as surface roughness, poor adhesion, and form a contamination risk in the fab.

Leakage current in capacitor dielectric materials can be due to Schottky emission, Frenkel-Poole defects (e.g. oxygen vacancies (V_(ox)) or grain boundaries), or Fowler-Nordheim tunneling. Schottky emission, also called thermionic emission, is a common mechanism and is the heat-induced flow of charge over an energy barrier whereby the effective barrier height of a MIM capacitor controls leakage current. The effective barrier height is a function of the difference between the work function of the electrode and the electron affinity of the dielectric. The electron affinity of a dielectric is closely related to the conduction band offset of the dielectric. The Schottky emission behavior of a dielectric layer is generally determined by the properties of the dielectric/electrode interface. Frenkel-Poole emission allows the conduction of charges through a dielectric layer through the interaction with defect sites such as vacancies, grain boundaries, and the like. As such, the Frenkel-Poole emission behavior of a dielectric layer is generally determined by the dielectric layer's bulk properties. Fowler-Nordheim emission allows the conduction of charges through a dielectric layer through tunneling. As such, the Fowler-Nordheim emission behavior of a dielectric layer is generally determined by the physical thickness of the dielectric layer. This leakage current is a primary driving force in the adoption of high k dielectric materials. The use of high k materials allows the physical thickness of the dielectric layer to be as thick as possible while maintaining the required capacitance (see Eqn 1 above).

Additionally, DRAM capacitor stacks may undergo various refinement process steps after fabrication. These refinement processes may include post-fabrication chemical and thermal processing (i.e., oxidation or reduction). For instance, after initial DRAM capacitor stack fabrication, a number of high temperature (up to about 600 C) processes may be applied to complete the device fabrication. During these subsequent process steps, the DRAM capacitor materials must remain chemically, physically, and structurally stable. They must maintain the structural, compositional, physical, and electrical properties that have been developed. Furthermore, they should not undergo significant interaction or reaction which may degrade the performance of the DRAM capacitor.

High k dielectric materials have been developed that exhibit low leakage current at low temperatures (i.e. room temperature), but exhibit unacceptably high leakage current at elevated temperatures (i.e. 90 C). For example, an Al-doped TiO₂ dielectric layer that achieves an EOT of 0.5 nm has exhibited leakage current of 3×10⁻⁸ A/cm² at 0.6V. If the temperature is raised to 90 C, the leakage current increases to 2×10⁻⁶ A/cm² at 0.6V. This is above the required specification of 1×10⁻⁷ A/cm².

Therefore, there is a need to develop dielectric materials that exhibit a high k-value, a low EOT, and low leakage current for DRAM capacitors. Furthermore, the leakage current should remain low at elevated temperatures.

SUMMARY OF THE DISCLOSURE

In some embodiments of the present invention, a high k dielectric material such as the rutile phase of TiO₂ is admixed with a high k material such as ZrO₂ or HfO₂ that has a higher bandgap to produce a compound high k material that exhibits a high k value, a higher bandgap, and reduced leakage current. In some embodiments, the compound high k material is further doped with a metal dopant to further reduce the leakage current.

BRIEF DESCRIPTION OF THE DRAWINGS

To facilitate understanding, identical reference numerals have been used, where possible, to designate identical elements that are common to the figures. The drawings are not to scale and the relative dimensions of various elements in the drawings are depicted schematically and not necessarily to scale.

The techniques of the present invention can readily be understood by considering the following detailed description in conjunction with the accompanying drawings, in which:

FIG. 1 illustrates a flow chart illustrating a method for fabricating a DRAM capacitor stack, in accordance with some embodiments of the present invention.

FIG. 2 illustrates a simplified cross-sectional view of a DRAM capacitor stack fabricated in accordance with some embodiments of the present invention.

FIG. 3 illustrates a simplified cross-sectional view of a DRAM memory cell fabricated in accordance with some embodiments of the present invention.

DETAILED DESCRIPTION

A detailed description of one or more embodiments is provided below along with accompanying figures. The detailed description is provided in connection with such embodiments, but is not limited to any particular example. The scope is limited only by the claims and numerous alternatives, modifications, and equivalents are encompassed. Numerous specific details are set forth in the following description in order to provide a thorough understanding. These details are provided for the purpose of example and the described techniques may be practiced according to the claims without some or all of these specific details. For the purpose of clarity, technical material that is known in the technical fields related to the embodiments has not been described in detail to avoid unnecessarily obscuring the description.

The dielectric constant of a dielectric material may be dependent upon the crystalline phase(s) of the material. For example, in the case of TiO₂, the anatase crystalline phase of TiO₂ has a dielectric constant of approximately 40, while the rutile crystalline phase of TiO₂ can have a dielectric constant of approximately >80. Due to the higher-k value of the rutile-phase, it is desirable to produce TiO₂ based DRAM capacitors with the TiO₂ in the rutile-phase. The relative amounts of the anatase phase and the rutile phase can be determined from x-ray diffraction (XRD). From Eqn. 1 above, a TiO₂ layer in the rutile-phase could be physically thicker and maintain the same desired capacitance as a TiO₂ layer in the anatase phase. The increased physical thickness is important for lowering the leakage current of the capacitor. The anatase phase will transition to the rutile phase at high temperatures (>800 C). However, high temperature processes are undesirable in the manufacture of DRAM devices. Traditional annealing processes may degrade the underlying electrode due to oxidation or promote interaction between the TiO₂ and the electrode material. The degradation may lead to an increase in the EOT and/or increased device leakage.

The crystal phase of an underlying layer can be used to influence the growth of a specific crystal phase of a subsequent material if their crystal structures are similar and their lattice constants are similar. This technique is well known in technologies such as epitaxial growth. The same concepts have been extended to the growth of thin films where the underlying layer can be used as a “template” to encourage the growth of a desired phase over other competing crystal phases.

Conductive metal oxides, conductive metal silicides, conductive metal nitrides, or combinations thereof comprise other classes of materials that may be suitable as DRAM capacitor electrodes. Generally, transition metals and their conductive binary compounds form good candidates as electrode materials. The transition metals exist in several oxidation states. Therefore, a wide variety of compounds are possible. Different compounds may have different crystal structures, electrical properties, etc. It is important to utilize the proper compound for the desired application.

In one example, molybdenum has several binary oxides of which MoO₂ and MoO₃ are two examples. These two oxides of molybdenum have different properties. MoO₂ is conductive and has shown great promise as an electrode material in DRAM capacitors. MoO₂ has a distorted rutile crystal structure and can serve as an acceptable template to promote the deposition of the rutile-phase of TiO₂ as discussed above. MoO₂ also has a high work function (can be >5.0 eV depending on process history) which helps to minimize the leakage current of the DRAM device. However, oxygen-rich phases (MoO_(2+x)) of MoO₂ degrade the performance of the MoO₂ electrode because they act more like insulators and have crystal structures that do not promote the deposition of the rutile-phase of TiO₂. For example, MoO₃ (the most oxygen-rich phase) is a dielectric material and has an orthorhombic crystal structure.

In a second example, TiN may be used as an electrode. TiN has a crystal structure of NaCl-type which is cubic. As such, TiN can serve as an acceptable template to promote the deposition of the tetragonal or cubic phases of ZrO₂. TiN has a high work function (can be ≧4.8 eV depending on process history) which is compatible with the higher band gap of ZrO₂. ZrO₂ is a dielectric material that can exhibit a k-value as high as ˜45 depending on the processing conditions.

Generally, a deposited thin film may be amorphous, crystalline, or a mixture thereof. Furthermore, several different crystalline phases may exist. Therefore, processes (both deposition and post-treatment) must be developed to maximize the formation of crystalline MoO₂ and to minimize the presence of MoO_(2+x) phases. The MoO_(2+x) phases may form during the deposition of the electrode and may not be evenly distributed throughout the layer thickness. The MoO₂ electrode material may be deposited using any common deposition technique such as atomic layer deposition (ALD), plasma enhanced atomic layer deposition (PE-ALD), atomic vapor deposition (AVD), ultraviolet assisted atomic layer deposition (UV-ALD), chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), or physical vapor deposition (PVD). Typically, the MoO₂ electrode material must be annealed after deposition to fully crystallize the film. Even if the anneal is performed under an inert gas such as nitrogen, the presence of MoO_(2+x) phases are observed and the effective k-value of the TiO₂ dielectric subsequently deposited on such an electrode is lower than desired.

FIG. 1 illustrates a method, 100, for forming a DRAM capacitor stack in accordance with some embodiments of the present invention. The initial step, 102, comprises forming a first electrode layer on a substrate. Examples of suitable electrode materials comprise metals, metal alloys, conductive metal oxides, conductive metal silicides, conductive metal nitrides, and combinations thereof. A particularly interesting class of materials is the conductive metal oxides. Optionally, the first electrode layer can be subjected to an annealing or treatment process in step, 104. The annealing or treatment process will depend on the composition of the first electrode. If the first electrode is a metal such as TiN, then the treatment of the first electrode layer may include annealing using a Rapid Thermal Anneal (RTA) technique wherein the temperature is quickly raised in the presence of a nitrogen containing gas such as N₂, forming gas, NH₃, etc. Examples of such electrode treatment steps are further described in U.S. application Ser. No. 13/051,531 filed on Mar. 18, 2011, which is incorporated herein by reference. Optionally, the first electrode may be annealed in a reducing atmosphere. This is especially advantageous if the first electrode is a conductive metal oxide. One example of such an annealing process is further described in U.S. application Ser. No. 13/084,666 filed on Apr. 12, 2011, entitled “METHOD FOR FABRICATING A DRAM CAPACITOR” and is incorporated herein by reference.

Continuing with FIG. 1, in step 106, a compound high k dielectric material is formed by admixing a high k material such as the rutile phase of TiO₂ with another high k material that has a larger band gap such as ZrO₂ or HfO₂. As used herein, a “compound high k dielectric material” will be understood to mean an admixture of different materials that forms a single phase. Although a compound high k dielectric material will be discussed as a specific example, other admixtures that do not form a single phase will also be understood to be within the scope of the present invention. That is, the formation of a single phase is not a limitation of the present invention. Additional dopants may also be added to the compound high k dielectric material to further reduce the leakage current. The compound high k dielectric material may be formed as a hybrid stack or a nanolaminate stack. Optionally, the dielectric layer can receive a post dielectric anneal (PDA) treatment in step 108. The PDA treatment serves to crystallize the dielectric layer and ensure that the material is fully oxidized. The next step, 110, comprises forming a second electrode layer on the compound high k dielectric material. The second electrode layer may be a conductive binary metal compound material as described above, a metal, or a combination thereof. The remaining full DRAM device (not shown) would then be manufactured using well known techniques. Optionally, the DRAM capacitor stack may undergo a post metallization anneal (PMA) treatment in step 112. Examples of the PDA treatment described above and the PMA treatment are further described in U.S. application Ser. No. 13/159,842 filed on Jun. 14, 2011, entitled “METHOD OF PROCESSING MIM CAPACITORS TO REDUCE LEAKAGE CURRENT” and is incorporated herein by reference.

Those skilled in the art will appreciate that each of the first electrode layer, the dielectric layer, and the second electrode layer used in the DRAM MIM capacitor may be formed using any common formation technique such as ALD, PE-ALD, AVD, UV-ALD, CVD, PECVD, or PVD. Generally, because of the complex morphology of the DRAM capacitor structure, ALD, PE-ALD, AVD, or CVD are preferred methods of formation. However, any of these techniques are suitable for forming each of the various layers discussed below. Those skilled in the art will appreciate that the teachings described below are not limited by the technology used for the deposition process.

In FIGS. 2, and 3 below, a capacitor stack is illustrated using a simple planar structure. Those skilled in the art will appreciate that the description and teachings to follow can be readily applied to any simple or complex capacitor morphology. The drawings are for illustrative purposes only and do not limit the application of the present invention.

FIG. 2 illustrates a simple capacitor stack, 200, consistent with some embodiments of the present invention. Using the method as outlined in FIG. 1 and described above, first electrode layer, 202, is formed on substrate, 201. Generally, the substrate has already received several processing steps in the manufacture of a full DRAM device. First electrode layer, 202, comprises one of metals, metal alloys, conductive metal oxides, conductive metal nitrides, conductive metal silicides, conductive metal carbides, etc. Optionally, first electrode, 202, can be annealed to crystallize the material.

In the next step, a compound high k dielectric material, 204, would then be formed on the first electrode layer, 202 as an admixture of two or more high k materials. A wide variety of dielectric materials have been targeted for use in DRAM capacitors. Examples of suitable dielectric materials comprise SiO₂, a bilayer of SiO₂ and Si_(x)N_(y), SiON, Al₂O₃, HfO₂, HfSiO_(x), ZrO₂, Ta₂O₅, TiO₂, Nb₂O₅, SrTiO₃ (STO), BaSrTiO_(x) (BST), PbZrTiO_(x) (PZT), or doped versions of the same. Specific examples of interest are admixtures of TiO₂ and ZrO₂ and admixtures of TiO₂ and HfO₂. Table 1 below lists a number of properties for TiO₂, ZrO₂, and HfO₂ including their k value, bandgap (eV), conduction band offset (CBO) (eV), and valance band offset (VBO) (eV). However, other admixture combinations may also yield the benefits discussed previously. The compound high k dielectric material may be formed as a single layer or may be formed as a hybrid or nanolaminate structure. Typically, compound high k dielectric material, 204, is subjected to a PDA treatment before the formation of the second electrode as mentioned earlier. The PDA treatment serves to crystallize the compound high k material and repair defects in the compound high k material. The compound high k material may also comprise a dopant of a an element such as Al, Zr, Ge, Hf, Sn, Sr, Y, Si, Ti, La, Er, Ga, Gd, Mg, Co, or combinations thereof.

TABLE 1 Material k Value Bandgap (eV) CBO (eV) VBO (eV) TiO₂  30->170 3.1 0.00 1.90 ZrO₂ 25-43 5.8 1.50 3.20 HfO₂ 25 5.8 1.40 3.30

In the next step, the second electrode layer, 206, is formed on the compound high k dielectric material, 204. The second electrode layer may be a conductive binary metal compound material as described above, a metal, metal alloy, or a combination thereof.

An example of one embodiment will be described using FIG. 2 as a template. In a first step, a first electrode, 202, is formed on a substrate. Generally, the substrate has already received several processing steps in the manufacture of a full DRAM device. First electrode layer, 202, comprises one of metals, metal alloys, conductive metal oxides, conductive metal nitrides, conductive metal silicides, conductive metal carbides, etc. For this example, first electrode layer, 202, comprises a conductive metal oxide that may serve to promote the rutile phase of TiO₂. Examples of such conductive metal oxides include the conductive compounds of molybdenum oxide, tungsten oxide, ruthenium oxide, iron oxide, iridium oxide, chromium oxide, manganese oxide, tin oxide, cobalt oxide, or nickel oxide. A specific electrode material of interest is the crystalline MoO₂ compound of molybdenum dioxide.

Optionally, first electrode, 202, can be annealed to crystallize the material. In the case of crystalline MoO₂, it is advantageous to anneal the first electrode in a reducing atmosphere to prevent the formation of oxygen-rich compounds as discussed earlier.

In one example of the present invention, a first electrode comprising between about 5 nm and about 10 nm of molybdenum oxide is formed on a substrate. The molybdenum oxide electrode material is formed at a process temperature between about 125 C and 250 C using an ALD process technology. Optionally, the substrate with the first electrode is then annealed in a reducing atmosphere comprising between about 1% and about 10% H₂ in N₂ and advantageously between about 5% and about 10% H₂ in N₂ at 500 C. for between about 1 millisecond and about 60 minutes.

In the next step, compound high k dielectric material, 204, would then be formed on the annealed first electrode layer, 202. A wide variety of dielectric materials have been targeted for use in DRAM capacitors. Examples of suitable dielectric materials comprise SiO₂, a bilayer of SiO₂ and Si_(x)N_(y), SiON, Al₂O₃, HfO₂, HfSiO_(x), ZrO₂, Ta₂O₅, TiO₂, Nb₂O₅, SrTiO₃ (STO), BaSrTiO_(x) (BST), PbZrTiO_(x) (PZT), or doped versions of the same. Specific examples of interest are admixtures of TiO₂ and ZrO₂. The composition range of ZrO₂ may be between about 30 atomic % and about 80 atomic and advantageously between about 40 atomic % and about 60 atomic %. The ZrO₂ atomic percent is calculated as ZrO₂/(ZrO₂+TiO₂) atomic percent. The compound high k material may also comprise a dopant of a an element such as Al, Zr, Ge, Hf, Sn, Sr, Y, Si, Ti, La, Er, Ga, Gd, Mg, Co, or combinations thereof. These compound high k materials may be formed as a single layer or may be formed as a hybrid or nanolaminate structure. Typically, compound high k material, 204, is subjected to a PDA treatment before the formation of the second electrode as discussed previously. A specific compound high k material of interest is TiO₂ admixed with ZrO₂ and doped with Al₂O₃ to between about 0 atomic % and about 15 atomic % Al where the Al atomic percent is calculated as Al/(Zr+Ti+Al) atomic percent.

In a specific example, the compound high k material comprises between about 6 nm to about 10 nm of TiO₂ admixed with ZrO₂ wherein at least 30% of the TiO₂ is present in the rutile phase. The composition range of ZrO₂ may be between about 30 atomic % and about 80 atomic % and advantageously between about 40 atomic % and about 60 atomic %. The ZrO₂ atomic percent is calculated as ZrO₂/(ZrO₂+TiO₂) atomic percent. Generally, the TiO₂/ZrO₂ compound high k material may either be a single film or may comprise a nanolaminate. If admixed in a 1:1 ratio, the TiO₂ and ZrO₂ form a ZrTiO₄ material with a bandgap of about 3.7 eV. Advantageously, the TiO₂/ZrO₂ compound high k material is doped with Al₂O₃ at a concentration between about 5 atomic % and about 15 atomic % Al where the Al atomic percent is calculated as Al/(Zr+Ti+Al) atomic percent. The TiO₂/ZrO₂ compound high k material is formed at a process temperature between about 200 C and 350 C using an ALD process technology. The substrate with the first electrode and compound high k material is then annealed in an oxidizing atmosphere comprising between about 0% O₂ to about 100% O₂ in N₂ and advantageously between about 0% O₂ to about 20% O₂ in N₂ at temperatures between about 400 C to about 600 C for between about 1 millisecond to about 60 minutes. The TiO₂ portion of the compound high k material imparts a high k value to the material, the ZrO₂ portion helps to reduce the leakage current because of the high bandgap, and the dopant portion helps to further reduce the leakage current due to the neutralization of free carriers induced by defects such as oxygen vacancies in the bulk dielectric films, by the acceptor-type dopants.

Second electrode, 206, is then formed on compound high k material, 204. The second electrode is typically a metal such as TiN, TaN, TiAlN, W, WN, Mo, Mo₂N, or others. Advantageously, the second electrode is TiN. The second electrode is typically between about 5 nm and 50 nm in thickness. Typically, the capacitor stack is then subjected to a PMA treatment as discussed previously.

In another example of the present invention, a first electrode comprising between about 5 nm and about 10 nm of molybdenum oxide is formed on a substrate. The molybdenum oxide electrode material is formed at a process temperature between about 125 C and 250 C using an ALD process technology. Optionally, the substrate with the first electrode is then annealed in a reducing atmosphere comprising between about 1% and about 10% H₂ in N₂ and advantageously between about 5% and about 10% H₂ in N₂ at 500 C for between about 1 millisecond and about 60 minutes.

In the next step, compound high k dielectric material, 204, would then be formed on the annealed first electrode layer, 202. A wide variety of dielectric materials have been targeted for use in DRAM capacitors. Examples of suitable dielectric materials comprise SiO₂, a bilayer of SiO₂ and Si_(x)N_(y), SiON, Al₂O₃, HfO₂, HfSiO_(x), ZrO₂, Ta₂O₅, TiO₂, Nb₂O₅, SrTiO₃ (STO), BaSrTiO_(x) (BST), PbZrTiO_(x) (PZT), or doped versions of the same. Specific examples of interest are admixtures of TiO₂ and HfO₂. The composition range of HfO₂ may be between about 30 atomic % and about 80 atomic % and advantageously between about 40 atomic % and about 60 atomic %. The HfO₂ atomic percent is calculated as HfO₂/(HfO₂+TiO₂) atomic percent. The compound high k dielectric material may also comprise a dopant of a an element such as Al, Zr, Ge, Hf, Sn, Sr, Y, Si, Ti, La, Er, Ga, Gd, Mg, Co, or combinations thereof. These compound high k dielectric materials may be formed as a single layer or may be formed as a hybrid or nanolaminate structure. Typically, compound high k dielectric material, 204, is subjected to a PDA treatment before the formation of the second electrode as discussed previously. A specific compound high k dielectric material of interest is TiO₂ admixed with HfO₂ and doped with Al₂O₃ to between about % atomic % and about 15 atomic % Al where the Al atomic percent is calculated as Al/(Zr+Ti+Al) atomic percent.

In a specific example, the compound high k material comprises between about 6 nm to about 10 nm of TiO₂ admixed with HfO₂ wherein at least 30% of the TiO₂ is present in the rutile phase. The composition range of HfO₂ may be between about 30 atomic % and about 80 atomic % and advantageously between about 40 atomic % and about 60 atomic %. The HfO₂ atomic percent is calculated as HfO₂/(HfO₂+TiO₂) atomic percent. Generally, the TiO₂/HfO₂ compound high k material may either be a single film or may comprise a nanolaminate. If admixed in a 1:1 ratio, the TiO₂ and HfO₂ form a HfTiO₄ material with a bandgap of about 4.4 eV. Advantageously, the TiO₂/HfO₂ compound high k material is doped with Al₂O₃ at a concentration between about 5 atomic % and about 15 atomic % Al where the Al atomic percent is calculated as Al/(Zr+Ti+Al) atomic percent. The TiO₂/HfO₂ compound high k material is formed at a process temperature between about 200 C and 350 C using an ALD process technology. The substrate with the first electrode and compound high k material is then annealed in an oxidizing atmosphere comprising between about 0% O₂ to about 100% O₂ in N₂ and advantageously between about 0% O₂ to about 20% O₂ in N₂ at temperatures between about 400 C to about 600 C for between about 1 millisecond to about 60 minutes. The TiO₂ portion of the compound high k material imparts a high k value to the material, the HfO₂ portion helps to reduce the leakage current because of the high bandgap, and the dopant portion helps to further reduce the leakage current due to the neutralization of free carriers induced by defects such as oxygen vacancies in the bulk dielectric films, by the acceptor-type dopants.

Second electrode, 206, is then formed on compound high k material, 204. The second electrode is typically a metal such as TiN, TaN, TiAlN, W, WN, Mo, Mo₂N, or others. Advantageously, the second electrode is TiN. The second electrode is typically between about 5 nm and 50 nm in thickness. Typically, the capacitor stack is then subjected to a PMA treatment as discussed previously.

An example of a specific application of some embodiments of the present invention is in the fabrication of capacitors used in the memory cells in DRAM devices. DRAM memory cells effectively use a capacitor to store charge for a period of time, with the charge being electronically “read” to determine whether a logical “one” or “zero” has been stored in the associated cell. Conventionally, a cell transistor is used to access the cell. The cell transistor is turned “on” in order to store data on each associated capacitor and is otherwise turned “off” to isolate the capacitor and preserve its charge. More complex DRAM cell structures exist, but this basic DRAM structure will be used for illustrating the application of this disclosure to capacitor manufacturing and to DRAM manufacturing. FIG. 3 is used to illustrate one DRAM cell, 320, manufactured using a compound high k material as discussed previously. The cell, 320, is illustrated schematically to include two principle components, a cell capacitor, 300, and a cell transistor, 302. The cell transistor is usually constituted by a MOS transistor having a gate, 314, source, 310, and drain, 312. The gate is usually connected to a word line and one of the source or drain is connected to a bit line. The cell capacitor has a lower or storage electrode and an upper or plate electrode. The storage electrode is connected to the other of the source or drain and the plate electrode is connected to a reference potential conductor. The cell transistor is, when selected, turned “on” by an active level of the word line to read or write data from or into the cell capacitor via the bit line.

As was described previously in connection with FIG. 2, the cell capacitor, 300, comprises a first electrode, 304, formed on substrate, 301. The first electrode, 304, is connected to the source or drain of the cell transistor, 302. For illustrative purposes, the first electrode has been connected to the source, 310, in this example. For the purposes of illustration, first electrode, 304, will be crystalline MoO₂ in this example. As discussed previously, first electrode, 304, may be subjected to an anneal in a reducing atmosphere before the formation of the dielectric layer to crystallize the MoO₂ and to reduce any MoO_(2+x) compounds that may have formed during the formation of the first electrode. Compound high k material, 306, is formed on top of the first electrode. For the purposes of illustration, compound high k material, 306, will be rutile-phase TiO₂ admixed with either ZrO₂ or HfO₂ and optionally doped with Al. Typically, the compound high k material is then subjected to a PDA treatment. The second electrode, 308, is then formed on top of the compound high k material. For the purposes of illustration, the second electrode, 308, will be TiN in this example. This completes the formation of the capacitor stack. Typically, the capacitor stack is then subjected to a PMA treatment.

Although the foregoing examples have been described in some detail for purposes of clarity of understanding, the invention is not limited to the details provided. There are many alternative ways of implementing the invention. The disclosed examples are illustrative and not restrictive. 

What is claimed:
 1. A semiconductor layer stack comprising: a first electrode layer formed on a substrate, the first electrode layer comprising MoO2; a compound high k dielectric material formed on the first electrode layer, wherein the compound high k dielectric material comprises two or more high k dielectric material components, wherein one of the two or more high k dielectric material components comprises TiO₂, wherein at least 30% of TiO₂ is present in a rutile phase, wherein a concentration of the one of the two or more high k dielectric material components of the compound high k dielectric material is in the range of between 30 atomic % and 80 atomic %; and a second electrode formed on the compound high k dielectric material.
 2. The semiconductor layer stack of claim 1, wherein the concentration of the one of the two or more high k dielectric material components of the compound high k material is in the range between 40 atomic % and 60 atomic %.
 3. The semiconductor layer stack of claim 1, wherein the two or more high k dielectric material components of the compound high k material are selected from the group consisting of SiO₂, a bilayer of SiO₂ and SixNy, SiON, Al₂O₃, HfO₂, HfSiO₂, ZrO₂, Ta₂O₅, TiO₂, Nb₂O₅, SrTiO₃ (STO), BaSrTiO_(x) (BST), and PbZrTiO_(x) (PZT).
 4. The semiconductor layer stack of claim 3, wherein the two or more high k dielectric material components of the compound high k material are TiO₂ and ZrO₂.
 5. The semiconductor layer stack of claim 4 wherein the concentration of a ZrO₂ is in the range between about 30 atomic % and about 80 atomic %.
 6. The semiconductor layer stack of claim 5 wherein the concentration of the ZrO₂ is in the range between about 40 atomic % and about 60 atomic %.
 7. The semiconductor layer stack of claim 4 further comprising a dopant in the compound high k dielectric material.
 8. The semiconductor layer stack of claim 7 wherein the dopant is one of Al, Ge, Hf, Sn, Sr, Y, Si, La, Er, Ga, Gd, Mg, Co, or combinations thereof.
 9. The semiconductor layer stack of claim 8 wherein the dopant is Al₂O₃ and wherein the Al is present in an amount between 5 atomic % and 15 atomic %.
 10. The semiconductor layer stack of claim 3 wherein the two or more high k dielectric material components of the compound high k material are TiO₂ and HfO₂.
 11. The semiconductor layer stack of claim 10 wherein a concentration of the HfO₂ is in the range between about 30 atomic % and about 80 atomic %.
 12. The semiconductor layer stack of claim 11 wherein the concentration of the HfO₂ is in the range between about 40 atomic % and about 60 atomic %.
 13. The semiconductor layer stack of claim 10 further comprising a dopant in the compound high k dielectric material.
 14. The semiconductor layer stack of claim 13 wherein the dopant is one of Al, Zr, Ge, Sn, Sr, Y, Si, La, Er, Ga, Gd, Mg, Co, or combinations thereof.
 15. The semiconductor layer stack of claim 14 wherein the dopant is Al₂O₃ and wherein the Al is present in an amount between 5 atomic % and 15 atomic %.
 16. The semiconductor layer stack of claim 1 wherein the first electrode is MoO₂, the two or more high k dielectric material components of the compound high k dielectric material are TiO₂ and ZrO₂, and the second electrode is TiN.
 17. The semiconductor layer stack of claim 16 wherein the compound high k dielectric material further comprises a dopant of Al₂O₃.
 18. The semiconductor layer stack of claim 1 wherein the first electrode is MoO₂, the two or more high k dielectric material components of the compound high k dielectric material are TiO₂ and HfO₂, and the second electrode is TiN.
 19. The semiconductor layer stack of claim 18 wherein the compound high k dielectric material further comprises a dopant of Al₂O₃. 